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Riding an electron wave into the future of microchip fabrication

Advanced plasma-based etching is a key enabler of Moore’s Law that observes that the number of transistors on integrated circuits doubles nearly every two years. It is the plasma’s ability to reproduce fine patterns on silicon that makes this scaling possible and has made plasma sources ubiquitous in microchip manufacturing.

Fuente : http://www.eurekalert.org/pub_releases/2013-11/aps…

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